二极刻蚀程序代码
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e10 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time30temperature1000 dryo2 press1
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e15 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time30temperature1000 dryo2 press1
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e15 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time40 temperature1500 dryo2 press2
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
《香当网》用户分享的内容，不代表《香当网》观点或立场，请自行判断内容的真实性和可靠性！
该内容是文档的文本内容，更好的格式请下载文档
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e10 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time30temperature1000 dryo2 press1
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e15 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time30temperature1000 dryo2 press1
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
go athena
line x loc0 spac01
line x loc10 spac01
line y loc0 spac001
line y loc1 spac005
line y loc2 spac01
init silicon cboron10e15 orientation100 twod spacemult2
OXIDE INITIAL001
diffuse time40 temperature1500 dryo2 press2
RATEDEPO MACHINEPECVD NITRIDE DEPRATE1500 AM CVD STEPCOV75
deposit nitride THICK05
RATEETCH MACHINEWETETCH OXIDE WETETCH ISOTROPIC5 UM
RATEETCH MACHINEWETETCH NITRIDE WETETCH ISOTROPIC1 UM
ETCH NITRIDE LEFT P1X5
ETCH OXIDE LEFT P1X5
DEPOSIT OXIDE THICK05 DIV6 CPHOSPHORUS1e20
DIFFUSE TIME30 TEMPERATURE1000 NITROGEN PRESS1
ETCH OXIDE ALL
ETCH NITRIDE ALL
tonyplot
quit
《香当网》用户分享的内容，不代表《香当网》观点或立场，请自行判断内容的真实性和可靠性！
该内容是文档的文本内容，更好的格式请下载文档
